REQUIREMENT

• Purchase purpose:
  Mass production Experimental Research Small batch trial flow Other
• Your product type, name or direction of R&D topic:
• The type of lithography machine required by your organization:
  Fully automatic photolithography machine (suitable for mass production)
  Manual loading and unloading of substrate auto-alignment lithography (suitable for medium volume flow)
  Manual loading and unloading of substrates for manual alignment of lithography (suitable for small batch trial flow)
  Desktop full manual lithography (suitable for R&D)
• Lithography Type：
  Single-sided lithography Double-sided auto-alignment Front-side lithography Single-sided lithography at this stage, may be upgraded to double-sided lithography in the future
• Substrate material for the required lithographic substrate：
  Silicon based Compound Semiconductor Glass Other
• Maximum size of lithographic substrate required：
  2" 4" 6" 8" 12" Other
• Finest line width to be lithographed:
  10um 5-10um 1-5um Submicron (less than 1um) 100nm 10nm below Other
• Required lithography alignment accuracy：
  ±1um or above Front±1um Back +-1.5um No alignment required
• The facilities of your lithography room：
  Already available Planning After June MOVE IN Planning 12 months later MOVE IN
• Estimated lithography procurement time：
  One to three months One month One week
• Name:
• Company Name:
• Company Address:
• E-mail:
• Phone:
• Submit

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